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[AIP ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology - Monterey (California) (8–13 June 2008)] AIP Conference Proceedings - Comparison of B, BF[sub 2] & B[sub 18]H[sub 22] for Extension and BF[sub 2], B[sub 18]H[sub 22] & In HALO Implantation for 32 nm Node Using Various Diffusion-less Annealing Techniques

[AIP ION IMPLANTATION TECHNOLOGY: 17th International Conference on Ion Implantation Technology - Monterey (California) (8–13 June 2008)] AIP Conference Proceedings - Comparison of B, BF[sub 2] & B[sub 18]H[sub 22] for Extension and BF[sub 2], B[sub 18]H[sub 22] & In HALO Implantation for 32 nm Node Using Various Diffusion-less Annealing Techniques

Borland, John; Kiyama, Hiroki; Seebauer, Edmund G.; Felch, Susan B.; Jain, Amitabh; Kondratenko, Yevgeniy V.
  • 作者Borland, John; Kiyama, Hiroki; Seebauer, Edmund G.; Felch, Susan B.; Jain, Amitabh; Kondratenko, Yevgeniy V.
  • 文件大小1607.91KB
  • 发表时间2008
  • DOI10.1063/1.3033684
  • 页码63-66
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