Effects of substrate bias and nitrogen flow ratio on the resistivity, composition, crystal structure, and reflectance of reactively sputtered hafnium-nitride film
- 作者Jiann-Shing Jeng; Chin-Hung Liu; J.S. Chen
- 卷第486卷
- 印刷ISSN0925-8388
- 文件大小548.42KB
- 发表时间2009
- DOI10.1016/j.jallcom.2009.07.023
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