[IEEE 2009 17th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Albany, NY, USA (2009.09.29-2009.10.2)] 2009 17th International Conference on Advanced Thermal Processing of Semiconductors - Application of laser annealing in the EU FP6 project D-DotFET
- 作者Nanver, L. K.; Jovanovic, V.; Biasotto, C.; van der Cingel, J.; Milosavljevic, S.
- 文件大小797.68KB
- 发表时间2009
- DOI10.1109/rtp.2009.5373443
- 页码1-7
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