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Effects of N Implantation before Gate Oxidation on the Performance of 4H-SiC MOSFET

Effects of N Implantation before Gate Oxidation on the Performance of 4H-SiC MOSFET

Poggi, Antonella; Moscatelli, Francesco; Solmi, Sandro; Nipoti, Roberta; Tamarri, Fabrizio; Pizzochero, G.
  • 期刊名称Materials Science Forum
  • 作者Poggi, Antonella; Moscatelli, Francesco; Solmi, Sandro; Nipoti, Roberta; Tamarri, Fabrizio; Pizzochero, G.
  • 电子ISSN1662-9752
  • 文件大小295.52KB
  • 发表时间2009
  • DOI10.4028/www.scientific.net/MSF.615-617.761
  • 页码761-764
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