Effects of pattern characteristics on copper CMP
- 期刊名称Journal of Semiconductors
- 作者Wenbiao, Ruan; Lan, Chen; Zhigang, Li; Tianchun, Ye
- 卷第30卷
- 期第4期
- 印刷ISSN1674-4926
- 文件大小134.35KB
- 发表时间2009-04
- DOI10.1088/1674-4926/30/4/046001
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