Silicon surface passivation by hot-wire CVD Si thin films studied by in situ surface spectroscopy
J.J.H. Gielis; B. Hoex; P.J. van den Oever; M.C.M. van de Sanden; W.M.M. Kessels
- 作者J.J.H. Gielis; B. Hoex; P.J. van den Oever; M.C.M. van de Sanden; W.M.M. Kessels
- 卷第517卷
- 期第12期
- 印刷ISSN0040-6090
- 文件大小643.20KB
- 发表时间2009
- DOI10.1016/j.tsf.2009.01.076
- 页码3456-3460