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Three-Step Room-Temperature Cleaning of Bare Silicon Surface for Radical-Reaction-Based Semiconductor Manufacturing

Hasebe, Rui; Teramoto, Akinobu; Kuroda, Rihito; Suwa, Tomoyuki; Sugawa, Shigetoshi; Ohmi, Tadahiro

期刊名称Journal of The Electrochemical Society
作者Hasebe, Rui; Teramoto, Akinobu; Kuroda, Rihito; Suwa, Tomoyuki; Sugawa, Shigetoshi; Ohmi, Tadahiro
卷第156卷
期第1期
印刷ISSN0013-4651
文件大小703.79KB
发表时间2009
DOI10.1149/1.2993153