Simulation of Fogging Electrons in Electron Beam Lithography
- 期刊名称Japanese Journal of Applied Physics
- 作者Kotera, Masatoshi; Maekawa, Takeshi
- 卷第48卷
- 期第6期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小387.80KB
- 发表时间2009-6-22
- DOI10.1143/JJAP.48.06FB05
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