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Two-dimensional threshold voltage model and design considerations for gate electrode work function engineered recessed channel nanoscale MOSFET: I

Two-dimensional threshold voltage model and design considerations for gate electrode work function engineered recessed channel nanoscale MOSFET: I

Chaujar, Rishu; Kaur, Ravneet; Saxena, Manoj; Gupta, Mridula; Gupta, R S
  • 期刊名称Semiconductor Science and Technology
  • 作者Chaujar, Rishu; Kaur, Ravneet; Saxena, Manoj; Gupta, Mridula; Gupta, R S
  • 卷第24卷
  • 期第6期
  • 印刷ISSN0268-1242
  • 电子ISSN1361-6641
  • 文件大小269.81KB
  • 发表时间2009-06-01
  • DOI10.1088/0268-1242/24/6/065005
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