SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Regularization of inverse photomask synthesis to enhance manufacturability
- 作者Chen, Alek C.; Jia, Ningning; Wong, Alfred K.; Han, Woo-Sung; Lin, Burn J.; Lam, Edmund Y.; Yen, Anthony
- 卷第7520卷
- 印刷ISSN0277-786X
- 文件大小627.20KB
- 发表时间2009
- DOI10.1117/12.837512
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