Multilayer Photoresist Stamps For Selective Plasma Treatment in Micrometer Scales
- 作者Uwe Stöhr; Antje Dohse; Paul Hoppe; Michael Thomas; Klaus Kadel; Claus-Peter Klages; Holger Reinecke
- 卷第6卷
- 期第4期
- 印刷ISSN1612-8850
- 电子ISSN1612-8869
- 文件大小369.33KB
- 发表时间2009
- DOI10.1002/ppap.200800217
- 页码228-233
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