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Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second Order Cone Programming(Mechanical Systems)

Optimization of Lens Adjustment in Semiconductor Lithography Equipment Using Quadratically Constrained and Second Order Cone Programming(Mechanical Systems)

SHINANO, Yuji; YOSHIHARA, Toshiyuki; MIYASHIRO, Ryuhei; FUKAGAWA, Youzou

作者SHINANO, Yuji; YOSHIHARA, Toshiyuki; MIYASHIRO, Ryuhei; FUKAGAWA, Youzou
卷第75卷
期第749期
印刷ISSN0387-5024
电子ISSN1884-8354
文件大小843.13KB
发表时间2009
DOI10.1299/kikaic.75.157
页码157-163

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