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Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas

Sheath and electron density dynamics in the normal and self-pulsing regime of a micro hollow cathode discharge in argon gas

C. Lazzaroni; P. Chabert; A. Rousseau; N. Sadeghi

作者C. Lazzaroni; P. Chabert; A. Rousseau; N. Sadeghi
卷第60卷
期第3期
印刷ISSN1434-6060
电子ISSN1434-6079
文件大小472.14KB
发表时间2010-12
DOI10.1140/epjd/e2010-00259-4
页码555-563

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