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[IEEE 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Gainesville, FL, USA (2010.09.28-2010.10.1)] 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - 22nm node p+ USJ defect analysis with various PAI and HALO structures using laser annealing

[IEEE 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - Gainesville, FL, USA (2010.09.28-2010.10.1)] 2010 18th International Conference on Advanced Thermal Processing of Semiconductors (RTP) - 22nm node p+ USJ defect analysis with various PAI and HALO structures using laser annealing

Borland, John; Tallian, Milkos; Kosztka, David; Pap, Aron; Mocsar, Kalman; Somogyi, Andras; Nadudvari, Gyorgy; Jastrzebski, Lubek; Pavelka, Tibor
  • 作者Borland, John; Tallian, Milkos; Kosztka, David; Pap, Aron; Mocsar, Kalman; Somogyi, Andras; Nadudvari, Gyorgy; Jastrzebski, Lubek; Pavelka, Tibor
  • 文件大小2942.67KB
  • 发表时间2010
  • DOI10.1109/rtp.2010.5623804
  • 页码158-165
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