450 mm dual frequency capacitively coupled plasma sources: Conventional, graded, and segmented electrodes
- 期刊名称Journal of Applied Physics
- 作者Yang, Yang; Kushner, Mark J.
- 卷第108卷
- 期第11期
- 印刷ISSN0021-8979
- 文件大小7196.19KB
- 发表时间2010
- DOI10.1063/1.3517104
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