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[IEEE 2010 IEEE 3rd International Nanoelectronics Conference (INEC) - Hong Kong, China (2010.01.3-2010.01.8)] 2010 3rd International Nanoelectronics Conference (INEC) - The model of nano-scale copper particles removal from silicon surface in high pressure CO<inf>2</inf>+H<inf>2</inf>O and CO<inf>2</inf>+H<inf>2</inf>O+IPA cleaning solutions

[IEEE 2010 IEEE 3rd International Nanoelectronics Conference (INEC) - Hong Kong, China (2010.01.3-2010.01.8)] 2010 3rd International Nanoelectronics Conference (INEC) - The model of nano-scale copper particles removal from silicon surface in high pressure CO2+H2O and CO2+H2O+IPA cleaning solutions

Xin Tan, ; Jiajue Chai, ; Zhang, Xiaogang; Jiawei Chen,
  • 作者Xin Tan, ; Jiajue Chai, ; Zhang, Xiaogang; Jiawei Chen,
  • 文件大小131.81KB
  • 发表时间2010
  • DOI10.1109/inec.2010.5424770
  • 页码592-593
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