[IEEE 2010 IEEE 3rd International Nanoelectronics Conference (INEC) - Hong Kong, China (2010.01.3-2010.01.8)] 2010 3rd International Nanoelectronics Conference (INEC) - The model of nano-scale copper particles removal from silicon surface in high pressure CO2+H2O and CO2+H2O+IPA cleaning solutions
Xin Tan, ; Jiajue Chai, ; Zhang, Xiaogang; Jiawei Chen,
- 作者Xin Tan, ; Jiajue Chai, ; Zhang, Xiaogang; Jiawei Chen,
- 文件大小131.81KB
- 发表时间2010
- DOI10.1109/inec.2010.5424770
- 页码592-593