In situ studies of the atomic layer deposition of thin HfO2 dielectrics by ultra high vacuum atomic force microscope

• 作者Krzysztof Kolanek; Massimo Tallarida; Konstantin Karavaev; Dieter Schmeisser
• 卷第518卷
• 期第16期
• 印刷ISSN0040-6090
• 文件大小1047.82KB
• 发表时间2010
• DOI10.1016/j.tsf.2009.12.060
• 页码4688-4691