SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Development of novel positive-tone resists for EUVL
La Fontaine, Bruno M.; Owada, Takanori; Shiotani, Hideaki; Aoyama, Kayoko; Kashiwamura, Takashi; Shibata, Mitsuru; Takeya, Testuro; Oizumi, Hiroaki; Itani, Toshiro
- 作者La Fontaine, Bruno M.; Owada, Takanori; Shiotani, Hideaki; Aoyama, Kayoko; Kashiwamura, Takashi; Shibata, Mitsuru; Takeya, Testuro; Oizumi, Hiroaki; Itani, Toshiro
- 卷第7636卷
- 印刷ISSN0277-786X
- 文件大小3946.66KB
- 发表时间2010
- DOI10.1117/12.846069