SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - Monitoring and control of photoresist properties and CD during photoresist processing
Yang, Geng; Raymond, Christopher J.; Ngo, Yit-Sung; Putra, Andi S.; Ang, Kar-Tien; Tay, Arthur; Fang, Zhong-Ping
- 作者Yang, Geng; Raymond, Christopher J.; Ngo, Yit-Sung; Putra, Andi S.; Ang, Kar-Tien; Tay, Arthur; Fang, Zhong-Ping
- 卷第7638卷
- 印刷ISSN0277-786X
- 文件大小954.89KB
- 发表时间2010
- DOI10.1117/12.846560