Modeling treatment-resistant depression

• 作者Benjamin Adam Samuels; Eduardo David Leonardo; Reto Gadient; Amanda Williams; Jin Zhou; Denis J. David; Alain Michel Gardier; Erik H.F. Wong; René Hen
• 卷第61卷
• 期第3期
• 印刷ISSN0028-3908
• 文件大小241.30KB
• 发表时间2011
• DOI10.1016/j.neuropharm.2011.02.017