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Epitaxial Growth of High Quality Ge Films on Si(001) Substrates by Nanocontact Epitaxy

Epitaxial Growth of High Quality Ge Films on Si(001) Substrates by Nanocontact Epitaxy

Nakamura, Yoshiaki; Murayama, Akiyuki; Ichikawa, Masakazu
  • 期刊名称Crystal Growth & Design
  • 作者Nakamura, Yoshiaki; Murayama, Akiyuki; Ichikawa, Masakazu
  • 卷第11卷
  • 期第7期
  • 印刷ISSN1528-7483
  • 电子ISSN1528-7505
  • 文件大小3464.38KB
  • 发表时间2011-07-06
  • DOI10.1021/cg200609u
  • 页码3301-3305
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