Toward a better understanding of the nanoscale degradation mechanisms of ultra-thin Si02∕Si films: Investigation of the best experimental conditions with a conductive-atomic force microscope
Arinero, R.; Hourani, W.; Touboul, A. D.; Gautier, B.; Ramonda, M.; Albertini, D.; Militaru, L.; Gonzalez-Velo, Y.; Guasch, C.; Saigné, F.
- 期刊名称Journal of Applied Physics
- 作者Arinero, R.; Hourani, W.; Touboul, A. D.; Gautier, B.; Ramonda, M.; Albertini, D.; Militaru, L.; Gonzalez-Velo, Y.; Guasch, C.; Saigné, F.
- 卷第110卷
- 期第1期
- 印刷ISSN0021-8979
- 文件大小2028.76KB
- 发表时间2011
- DOI10.1063/1.3603037