Site-specific acetylation mark on an essential chromatin-remodeling complex promotes resistance to replication stress
- 期刊名称Proceedings of the National Academy of Sciences
- 作者Charles, G. M.; Chen, C.; Shih, S. C.; Collins, S. R.; Beltrao, P.; Zhang, X.; Sharma, T.; Tan, S.; Burlingame, A. L.; Krogan, N. J.; Madhani, H. D.; Narlikar, G. J.
- 卷第108卷
- 期第26期
- 印刷ISSN0027-8424
- 电子ISSN1091-6490
- 文件大小1324.59KB
- 发表时间2011-06-28
- DOI10.1073/pnas.1019735108
- 页码10620-10625
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