Surface Passivation of GaAs Substrates with SiO2 Deposited Using ALD
- 期刊名称Electrochemical and Solid-State Letters
- 作者Dalapati, G. K.; Chia, C. K.; Mahata, C.; Das, T.; Maiti, C. K.; Kumar, M. K.; Gao, H.; Chiam, S. Y.; Tan, C. C.; Chua, C. T.; Cheng, Y. B.; Chi, D. Z.
- 卷第14卷
- 期第10期
- 印刷ISSN1099-0062
- 文件大小2011.18KB
- 发表时间2011
- DOI10.1149/1.3615963
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