High-rate reduction of copper oxide using atmospheric-pressure inductively coupled plasma microjets

• 作者Satomi Tajima; Shouichi Tsuchiya; Masashi Matsumori; Shigeki Nakatsuka; Takanori Ichiki
• 卷第519卷
• 期第20期
• 印刷ISSN0040-6090
• 文件大小851.36KB
• 发表时间2011
• DOI10.1016/j.tsf.2011.01.219
• 页码6773-6777