Atomically Controlled Plasma Processing for Group IV Quantum Heterostructure Formation
- 期刊名称Key Engineering Materials
- 作者Sakuraba, Masao; Sugawara, Katsutoshi; Murota, Junichi
- 卷第470卷
- 电子ISSN1662-9795
- 文件大小801.01KB
- 发表时间2011-2
- DOI10.4028/www.scientific.net/KEM.470.98
- 页码98-103
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