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Silicide Engineering to Boost Si Tunnel Transistor Drive Current

Silicide Engineering to Boost Si Tunnel Transistor Drive Current

Leonelli, Daniele; Vandooren, Anne; Rooyackers, Rita; Verhulst, Anne S.; Gendt, Stefan De; Heyns, Marc M.; Groeseneken, Guido
  • 期刊名称Japanese Journal of Applied Physics
  • 作者Leonelli, Daniele; Vandooren, Anne; Rooyackers, Rita; Verhulst, Anne S.; Gendt, Stefan De; Heyns, Marc M.; Groeseneken, Guido
  • 卷第50卷
  • 期第4期
  • 印刷ISSN0021-4922
  • 电子ISSN1347-4065
  • 文件大小755.63KB
  • 发表时间2011-4-20
  • DOI10.1143/jjap.50.04dc05
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