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The Model of Nano-Scale Copper Particle Removal from Silicon Surface in High Pressure CO<SUB>2</SUB>+H<SUB>2</SUB>O and CO<SUB>2</SUB>+H<SUB>2</SUB>O+IPA Cleaning Solutions

The Model of Nano-Scale Copper Particle Removal from Silicon Surface in High Pressure CO₂+H₂O and CO₂+H₂O+IPA Cleaning Solutions

Tan, Xin; Chai, Jiajue; Zhang, Xiaogang; Chen, Jiawei

期刊名称Journal of Nanoscience and Nanotechnology
作者Tan, Xin; Chai, Jiajue; Zhang, Xiaogang; Chen, Jiawei
卷第11卷
期第12期
印刷ISSN1533-4880
电子ISSN1533-4899
文件大小4937.31KB
发表时间2011-12-01
DOI10.1166/jnn.2011.3970
页码10782-10786

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