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[Computer Aided Chemical Engineering] 21st European Symposium on Computer Aided Process Engineering Volume 29 || Multiscale modeling of chemical vapor deposition of silicon

[Computer Aided Chemical Engineering] 21st European Symposium on Computer Aided Process Engineering Volume 29 || Multiscale modeling of chemical vapor deposition of silicon

Cheimarios, Nikolaos

作者Cheimarios, Nikolaos
文件大小381.72KB
发表时间2011
DOI10.1016/b978-0-444-53711-9.50027-4
页码131-135

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