Measurement of strain and strain relaxation in free-standing Si membranes by convergent beam electron diffraction and finite element method
H. Gao; K. Ikeda; S. Hata; H. Nakashima; D. Wang; H. Nakashima
- 作者H. Gao; K. Ikeda; S. Hata; H. Nakashima; D. Wang; H. Nakashima
- 卷第59卷
- 期第7期
- 印刷ISSN1359-6454
- 文件大小1583.79KB
- 发表时间2011
- DOI10.1016/j.actamat.2011.01.031
- 页码2882-2890