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Influence of nitrogen partial pressure on morphology, structure and transport properties of reactive sputtered polycrystalline TiN films

Influence of nitrogen partial pressure on morphology, structure and transport properties of reactive sputtered polycrystalline TiN films

X.C. Wang; X.M. Chen; B.H. Yang

作者X.C. Wang; X.M. Chen; B.H. Yang
卷第14卷
期第4期
印刷ISSN1293-2558
文件大小1037.92KB
发表时间2012
DOI10.1016/j.solidstatesciences.2012.01.022
页码435-439

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