In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy
Bertaud, Thomas; Sowinska, Malgorzata; Walczyk, Damian; Thiess, Sebastian; Gloskovskii, Andrei; Walczyk, Christian; Schroeder, Thomas
- 期刊名称Applied Physics Letters
- 作者Bertaud, Thomas; Sowinska, Malgorzata; Walczyk, Damian; Thiess, Sebastian; Gloskovskii, Andrei; Walczyk, Christian; Schroeder, Thomas
- 卷第101卷
- 期第14期
- 印刷ISSN0003-6951
- 文件大小1802.41KB
- 发表时间2012
- DOI10.1063/1.4756897