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In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy

In-operando and non-destructive analysis of the resistive switching in the Ti/HfO2/TiN-based system by hard x-ray photoelectron spectroscopy

Bertaud, Thomas; Sowinska, Malgorzata; Walczyk, Damian; Thiess, Sebastian; Gloskovskii, Andrei; Walczyk, Christian; Schroeder, Thomas
  • 期刊名称Applied Physics Letters
  • 作者Bertaud, Thomas; Sowinska, Malgorzata; Walczyk, Damian; Thiess, Sebastian; Gloskovskii, Andrei; Walczyk, Christian; Schroeder, Thomas
  • 卷第101卷
  • 期第14期
  • 印刷ISSN0003-6951
  • 文件大小1802.41KB
  • 发表时间2012
  • DOI10.1063/1.4756897
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