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An Atomic Layer Deposition Method to Fabricate Economical and Robust Large Area Microchannel Plates for Photodetectors

An Atomic Layer Deposition Method to Fabricate Economical and Robust Large Area Microchannel Plates for Photodetectors

Anil U. Mane; Qing Peng; Jeffrey W. Elam; Daniel C. Bennis; Christopher A. Craven; Michael A. Detarando; John R. Escolas; Henry J. Frisch; Slade J. Jokela; Jason McPhate; Michael J. Minot; Oswald H.W. Siegmund; Joseph M. Renaud; Robert G. Wagner; Matthew J. Wetstein
  • 作者Anil U. Mane; Qing Peng; Jeffrey W. Elam; Daniel C. Bennis; Christopher A. Craven; Michael A. Detarando; John R. Escolas; Henry J. Frisch; Slade J. Jokela; Jason McPhate; Michael J. Minot; Oswald H.W. Siegmund; Joseph M. Renaud; Robert G. Wagner; Matthew J. Wetstein
  • 卷第37卷
  • 文件大小1041.58KB
  • 发表时间2012
  • DOI10.1016/j.phpro.2012.03.720
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