Te-based chalcogenide films with high thermal stability for phase change memory

Wang, Guoxiang; Shen, Xiang; Nie, Qiuhua; Chen, Fen; Wang, Xunsi; Fu, Jing; Chen, Yu; Xu, Tiefeng; Dai, Shixun; Zhang, Wei; Wang, Rongping

期刊名称Journal of Applied Physics
作者Wang, Guoxiang; Shen, Xiang; Nie, Qiuhua; Chen, Fen; Wang, Xunsi; Fu, Jing; Chen, Yu; Xu, Tiefeng; Dai, Shixun; Zhang, Wei; Wang, Rongping
卷第111卷
期第9期
印刷ISSN0021-8979
文件大小1057.54KB
发表时间2012
DOI10.1063/1.4711069

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