Development of Cu Etching Using O$_{2}$ Cluster Ion Beam under Acetic Acid Gas Atmosphere
- 期刊名称Japanese Journal of Applied Physics
- 作者Suda, Takanori; Toyoda, Noriaki; Hara, Ken-ichi; Yamada, Isao
- 卷第51卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小576.37KB
- 发表时间2012-8-20
- DOI10.1143/JJAP.51.08HA02
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