发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

In situ study of the atomic layer deposition of HfO2 on Si

In situ study of the atomic layer deposition of HfO2 on Si

Kolanek, Krzysztof; Tallarida, Massimo; Michling, Marcel; Schmeisser, Dieter

期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
作者Kolanek, Krzysztof; Tallarida, Massimo; Michling, Marcel; Schmeisser, Dieter
卷第30卷
期第1期
印刷ISSN0734-2101
文件大小1947.35KB
发表时间2012
DOI10.1116/1.3668080

← 返回【学霸图书馆】主页