Photoresist Spray Coating Using a Shield Plate with an Aperture for Uniform Deposition onto Trench-Type Three-Dimensional Microdevice Structures
- 期刊名称Japanese Journal of Applied Physics
- 作者Kumagai, Shinya; Fukuda, Naoya; Tajima, Hisayoshi; Sasaki, Minoru
- 卷第51卷
- 期第2期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小854.79KB
- 发表时间2012-2-20
- DOI10.1143/jjap.51.02bl04
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