$SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Sub-micrometer pattern generation by diffractive mask-aligner lithography$

SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Sub-micrometer pattern generation by diffractive mask-aligner lithography

Zeitner, Uwe D.; Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Michaelis, Dirk; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg

作者Zeitner, Uwe D.; Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Michaelis, Dirk; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg
卷第8249卷
印刷ISSN0277-786X
文件大小1902.08KB
发表时间2012
DOI10.1117/12.909806

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SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Sub-micrometer pattern generation by diffractive mask-aligner lithography