Counter Dipole Layer Formation in Multilayer High-$k$ Gate Stacks

• 期刊名称Japanese Journal of Applied Physics
• 作者Hibino, Shinya; Nishimura, Tomonori; Nagashio, Kosuke; Kita, Koji; Toriumi, Akira
• 卷第51卷
• 印刷ISSN0021-4922
• 电子ISSN1347-4065
• 文件大小851.83KB
• 发表时间2012-8-2
• DOI10.1143/JJAP.51.081303