SPIE Proceedings [SPIE SPIE MOEMS-MEMS - San Francisco, California, USA (Saturday 21 January 2012)] Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V - Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography

Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Zeitner, Uwe D.; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg

作者Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Zeitner, Uwe D.; Schoenfeld, Winston V.; Rumpf, Raymond C.; von Freymann, Georg
卷第8249卷
印刷ISSN0277-786X
文件大小18014.68KB
发表时间2012
DOI10.1117/12.908737

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