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Low temperature deposition of low stress silicon nitride by reactive magnetron sputtering

Low temperature deposition of low stress silicon nitride by reactive magnetron sputtering

Mousinho, A P; Mansano, R D; Zambom, L S; Passaro, A
  • 期刊名称Journal of Physics: Conference Series
  • 作者Mousinho, A P; Mansano, R D; Zambom, L S; Passaro, A
  • 卷第370卷
  • 电子ISSN1742-6596
  • 文件大小564.99KB
  • 发表时间2012-06-19
  • DOI10.1088/1742-6596/370/1/012015
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