Multi-Layer Thick Resist Process Using Liquid-Crystal-Display Projection Exposure and Vacuum Treatment Process
- 期刊名称Journal of Photopolymer Science and Technology
- 作者Horiuchi, Toshiyuki; Shiratori, Sho
- 卷第25卷
- 期第4期
- 印刷ISSN0914-9244
- 电子ISSN1349-6336
- 文件大小487.60KB
- 发表时间2012
- DOI10.2494/photopolymer.25.455
- 页码455-460
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