Molecular simulation of pattern formation in electron beam lithography
- 期刊名称Microelectronic Engineering
- 作者Yasuda, Masaaki; Sakai, Hirofumi; Takai, Rina; Kawata, Hiroaki; Hirai, Yoshihiko
- 卷第112卷
- 印刷ISSN0167-9317
- 文件大小2844.90KB
- 发表时间2013-12
- DOI10.1016/j.mee.2013.03.119
- 页码287-290
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