Hydrogen Plasma Treatment of Silicon Dioxide for Improved Silane Deposition
- 期刊名称Langmuir
- 作者Gupta, Vipul; Madaan, Nitesh; Jensen, David S.; Kunzler, Shawn C.; Linford, Matthew R.
- 卷第29卷
- 期第11期
- 印刷ISSN0743-7463
- 电子ISSN1520-5827
- 文件大小940.04KB
- 发表时间2013-03-19
- DOI10.1021/la304491x
- 页码3604-3609
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