RESET-first bipolar resistive switching due to redox reaction in ALD HfO2 films
Kim, Jonggi; Lee, Sunghoon; Lee, Kyumin; Na, Heedo; Mok, In-Su; Kim, Youngjae; Ko, Dae-Hong; Sohn, Hyunchul
- 期刊名称Microelectronic Engineering
- 作者Kim, Jonggi; Lee, Sunghoon; Lee, Kyumin; Na, Heedo; Mok, In-Su; Kim, Youngjae; Ko, Dae-Hong; Sohn, Hyunchul
- 卷第112卷
- 印刷ISSN0167-9317
- 文件大小1448.08KB
- 发表时间2013-12
- DOI10.1016/j.mee.2013.05.014
- 页码46-51