Degradation of Memory Retention Characteristics in DRAM Chip by Si Thinning for 3-D Integration

Lee, Kangwook; Tanikawa, Seiya; Murugesan, Mariappine; Naganuma, Hideki; Shimamoto, Haro; Fukushima, Takafumi; Tanaka, Tetsu; Koyanagi, Mitsumasa

期刊名称IEEE Electron Device Letters
作者Lee, Kangwook; Tanikawa, Seiya; Murugesan, Mariappine; Naganuma, Hideki; Shimamoto, Haro; Fukushima, Takafumi; Tanaka, Tetsu; Koyanagi, Mitsumasa
卷第34卷
期第8期
印刷ISSN0741-3106
电子ISSN1558-0563
文件大小498.42KB
发表时间2013-08
DOI10.1109/led.2013.2265336
页码1038-1040

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