Hafnium Oxide Based CMOS Compatible Ferroelectric Materials

Schroeder, U.; Mueller, S.; Mueller, J.; Yurchuk, E.; Martin, D.; Adelmann, C.; Schloesser, T.; van Bentum, R.; Mikolajick, T.

期刊名称ECS Journal of Solid State Science and Technology
作者Schroeder, U.; Mueller, S.; Mueller, J.; Yurchuk, E.; Martin, D.; Adelmann, C.; Schloesser, T.; van Bentum, R.; Mikolajick, T.
卷第2卷
期第4期
印刷ISSN2162-8769
电子ISSN2162-8777
文件大小1000.75KB
发表时间2013-01-28
DOI10.1149/2.010304jss

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