Investigation of the Gate Bias Stress Instability in ZnO Thin Film Transistors by Low-Frequency Noise Analysis
- 期刊名称Japanese Journal of Applied Physics
- 作者Jeong, Kwang-Seok; Yun, Ho-Jin; Kim, Yu-Mi; Yang, Seung-Dong; Lee, Sang-Youl; Kim, Young-Su; Lee, Hi-Deok; Lee, Ga-Won
- 卷第52卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小771.74KB
- 发表时间2013-04-01
- DOI10.7567/JJAP.52.04CF04
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