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Chemical Structure of Interfacial Transition Layer Formed on Si(100) and Its Dependence on Oxidation Temperature, Annealing in Forming Gas, and Difference in Oxidizing Species

Chemical Structure of Interfacial Transition Layer Formed on Si(100) and Its Dependence on Oxidation Temperature, Annealing in Forming Gas, and Difference in Oxidizing Species

Suwa, Tomoyuki; Teramoto, Akinobu; Kumagai, Yuki; Abe, Kenichi; Li, Xiang; Nakao, Yukihisa; Yamamoto, Masashi; Nohira, Hiroshi; Muro, Takayuki; Kinoshita, Toyohiko; Sugawa, Shigetoshi; Ohmi, Tadahiro; Hattori, Takeo
  • 期刊名称Japanese Journal of Applied Physics
  • 作者Suwa, Tomoyuki; Teramoto, Akinobu; Kumagai, Yuki; Abe, Kenichi; Li, Xiang; Nakao, Yukihisa; Yamamoto, Masashi; Nohira, Hiroshi; Muro, Takayuki; Kinoshita, Toyohiko; Sugawa, Shigetoshi; Ohmi, Tadahiro; Hattori, Takeo
  • 卷第52卷
  • 印刷ISSN0021-4922
  • 电子ISSN1347-4065
  • 文件大小478.13KB
  • 发表时间2013-03-01
  • DOI10.7567/JJAP.52.031302
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