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Surface passivation of the Ge substrate by novel nitrogen plasma immersion treatment

Lin, Meng; Li, Ming; An, Xia; Yun, Quanxin; Li, Min; Li, Zhiqiang; Liu, Pengqiang; Zhang, Xing; Huang, Ru

期刊名称Semiconductor Science and Technology
作者Lin, Meng; Li, Ming; An, Xia; Yun, Quanxin; Li, Min; Li, Zhiqiang; Liu, Pengqiang; Zhang, Xing; Huang, Ru
卷第28卷
期第8期
印刷ISSN0268-1242
电子ISSN1361-6641
文件大小1807.28KB
发表时间2013-08-01
DOI10.1088/0268-1242/28/8/085010